PVD-Coating Processes

Lineare Gasfluss-Sputterquelle während der Schichtabscheidung.
© Fraunhofer IST
Linear gas flow sputtering source during film deposition.
Reaktive Arc-Beschichtung.
© Fraunhofer IWS Dresden
Reactive arc coating.

The institutes of the Group Light & Surfaces have a wide range of physical coating processes at their disposal. For example, Fraunhofer IST and Fraunhofer FEP share several central processes – physical vapor deposition (PVD) and, in particular, magnetron sputtering as well as hollow cathode discharge – for the production of a wide variety of coatings.

Physical Vapor Deposition (PVD)

Physical vapor deposition (PVD) is also used to coat components and small parts as bulk material. At Fraunhofer FEP, the “coating of components” group develops process and technology development in this field.

Atomic layer deposition (ALD) processes are used at Fraunhofer IOF to produce innovative and improved optical nanostructures. Examples are high-performance grids for laser applications or space missions. Furthermore, Fraunhofer IOF uses high-vacuum evaporation chambers with resistance and electron beam evaporators or plasma ion sources for various coating tasks: for example, the thermal vapor deposition of organic compounds.

Physical vapor phase deposition processes allow high-quality tribological and functional layers to be deposited in thicknesses from a few nanometers to a few tens of micrometers. For this purpose, Fraunhofer IWS can provide its clients with processes from high-rate vaporization to highly-activated plasma processes and their combinations. In particular, the institute focuses on the comprehensive use of arc discharges as the most effective source of energetic vapor jets.

Your contacts at the institutes are:

Contact Press / Media

Prof. Dr. Norbert Kaiser

Fraunhofer Institute for Applied Optics and Precision Engineering IOF
Albert-Einstein-Str. 7
07745 Jena

Phone +49 3641 807-321

Fax +49 3641 807-601

Contact Press / Media

Dr. Michael Vergöhl

Fraunhofer Institute for Surface Engineering and Thin Films IST
Bienroder Weg 54 e
38108 Braunschweig

Phone +49 531 2155-640

Contact Press / Media

Prof. Dr. Andreas Leson

Fraunhofer Institute for Material and Beam Technology IWS
Winterbergstr. 28
01277 Dresden

Phone +49 351 83391-3317

Fax +49 351 83391-3314

Contact Press / Media

Dr. Burkhard Zimmermann

Deputy Director | Division Director Electron Beam

Fraunhofer Institute for Electron Beam and Plasma Technology FEP
Winterbergstr. 28
01277 Dresden

Phone +49 351 2586-386

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