Fraunhofer Group for Light & Surfaces
Owing to the short wavelength of EUV light, developing semiconductor lithography into its spectral range entails enormous demands on the quality of surfaces and layers. Fraunhofer IOF has developed a process which enables it to characterize EUV mirror substrates over a large area with great sensitivity before they are coated. In addition, it has developed a system to characterize – specific to a wavelength – the reflection and scattering properties of EUV layer systems at 13.5 nm. Together with the existing modeling techniques and EUV system technologies of the Fraunhofer ILT, this results in a closed chain for the characterization of EUV components.