EUV metrology

© Fraunhofer ILT

Owing to the short wavelength of EUV light, developing semiconductor lithography into its spectral range entails enormous demands on the quality of surfaces and layers. Fraunhofer IOF has developed a process which enables it to characterize EUV mirror substrates over a large area with great sensitivity before they are coated. In addition, it has developed a system to characterize – specific to a wavelength – the reflection and scattering properties of EUV layer systems at 13.5 nm. Together with the existing modeling techniques and EUV system technologies of the Fraunhofer ILT, this results in a closed chain for the characterization of EUV components.

Your contacts at the institutes are:

Contact Press / Media

Prof. Dr. Norbert Kaiser

Fraunhofer Institute for Applied Optics and Precision Engineering IOF
Albert-Einstein-Str. 7
07745 Jena

Phone +49 3641 807-321

Fax +49 3641 807-601

Contact Press / Media

Dr. rer. nat. Serhiy Danylyuk

Fraunhofer Institute for Laser Technology ILT
Steinbachstr. 15
52074 Aachen

Phone +49 241 8906-525

Fax +49 241 8906-121