EUV-Processes

Charakterisierung von EUV-Schichten am Fraunhofer IOF.
© Photo Fraunhofer IOF

Characterization of EUV layers at Fraunhofer IOF.

Since the material and the short wavelengths of EUV and soft X-ray radiation interact so strongly, research has opened up new analysis and structuring processes in compact systems on the nanometer scale. Fraunhofer ILT has developed demonstrators for various applications, e.g. to conduct X-ray microscopy, reflectometry to analyze surface layer systems or interference lithography to generate nanostructures. The basic research on these studies is carried out in cooperation with the RWTH Aachen University within the group of Experimental Physics of Extreme Ultraviolet (EUV) and the Chair for Technology of Optical Systems (TOS).

Your contacts at the institutes are:

Contact Press / Media

Dr. rer. nat. Klaus Bergmann

Fraunhofer Institute for Laser Technology
Steinbachstr. 15
52074 Aachen

Phone +49 241 8906-302

Fax +49 241 8906-121